Piscataway, NJ, United States of America

Chunwei Chen

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 19(Granted Patents)


Location History:

  • Piscataway, NJ (US) (2007 - 2009)
  • Bridgewater, NJ (US) (2014 - 2015)
  • Whitehouse Station, NJ (US) (2020 - 2023)

Company Filing History:


Years Active: 2007-2025

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11 patents (USPTO):Explore Patents

Title: Innovations of Inventor Chunwei Chen

Introduction

Chunwei Chen, based in Piscataway, NJ, is a notable inventor recognized for his contributions to the field of photoresist compositions. With an impressive portfolio of 9 patents, his work showcases significant advancements in materials used in lithography and semiconductor technologies.

Latest Patents

One of Chunwei Chen’s latest innovations is a DNQ-type photoresist composition that includes alkali-soluble acrylic resins. This composition comprises an acrylic polymer with specific repeat units, a Novolak resin with a defined dissolution rate in aqueous TMAH, a diazonaphthoquinone (DNQ) photoactive compound, and an organic spin casting solvent. This innovative formula offers a process for utilizing the composition as a positive photoresist that is developable in aqueous base.

Another prominent patent is for a negative-working ultra-thick film photoresist. This aqueous base developable, photosensitive composition incorporates a polymer with specific repeat units, a radical photo-initiator component activated by a broad range of radiation, a crosslinker component, and various optional additives. This invention outlines a novel process leveraging this negative resist to produce high-quality lithographic images.

Career Highlights

Chunwei Chen has contributed his expertise while working for reputable companies such as Merck Patent GmbH and AZ Electronic Materials USA Corporation. Throughout his career, he has focused on the development of advanced materials that have greatly influenced the semiconductor industry.

Collaborations

In his professional journey, Chunwei has collaborated with notable colleagues including Weihong Liu and PingHung Lu. These partnerships have enriched his research and broadened the scope of his innovative projects.

Conclusion

Chunwei Chen's work exemplifies the spirit of innovation in the field of photoresists, significantly impacting the lithography and semiconductor industries. His patents reflect a deep understanding of material science and a commitment to advancing technology. As his career progresses, it will be intriguing to observe how his future inventions continue to shape the landscape of electronic manufacturing.

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