The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2021
Filed:
Apr. 18, 2017
Applicant:
AZ Electronic Materials (Luxembourg) S.Ă R.l., Luxembourg, LU;
Inventors:
Weihong Liu, Branchburg, NJ (US);
PingHung Lu, Bridgewater, NJ (US);
Chunwei Chen, Whitehouse Station, NJ (US);
SookMee Lai, Petaling Jaya, MY;
Yoshiharu Sakurai, Shizouka, JP;
Aritaka Hishida, Shizouka, JP;
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); C08K 5/378 (2006.01); C08L 53/00 (2006.01); C08L 61/06 (2006.01); G03F 7/023 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08K 5/378 (2013.01); C08L 53/005 (2013.01); C08L 61/06 (2013.01); G03F 7/0045 (2013.01); G03F 7/0048 (2013.01); G03F 7/0236 (2013.01); G03F 7/0397 (2013.01);
Abstract
The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.