Shizouka, Japan

Yoshiharu Sakurai


 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Kakegawa, JP (2014)
  • Shizouka, JP (2021)

Company Filing History:


Years Active: 2014-2021

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2 patents (USPTO):Explore Patents

Title: The Innovations of Yoshiharu Sakurai

Introduction

Yoshiharu Sakurai is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of 2 patents. His work focuses on developing compositions that enhance the imaging process in various applications.

Latest Patents

Sakurai's latest patents include a light-sensitive positive working photosensitive composition. This innovative material is particularly useful for imaging thick films, providing excellent film uniformity and promoting a good process latitude against feature pattern collapse during imaging and developing. Another patent involves a photosensitive composition that comprises a heterocyclic thiol compound or its tautomeric form, which can be utilized on substrates, including chalcophile substrates.

Career Highlights

Throughout his career, Sakurai has worked with prominent companies in the industry. He has been associated with Az Electronic Materials (Luxembourg) S.a.r.l. and Merck Patent GmbH, where he contributed to advancements in photosensitive technologies.

Collaborations

Sakurai has collaborated with notable professionals in his field, including Weihong Liu and SookMee Lai. Their combined expertise has furthered the development of innovative materials and processes.

Conclusion

Yoshiharu Sakurai's contributions to the field of photosensitive materials demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in imaging technologies, making him a significant figure in his industry.

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