Location History:
- Bridgewater, NJ (US) (2011 - 2020)
- Branchburg, NJ (US) (2021 - 2023)
Company Filing History:
7 out of 2,938 
3 out of 72 
1 out of 115 Years Active: 2011-2025
Title: **The Innovative Contributions of Weihong Liu in Photoresist Technology**
Introduction
Weihong Liu is an accomplished inventor based in Bridgewater, NJ, USA, known for his significant contributions to the field of photoresist technology. With a portfolio of 10 patents, he has made remarkable advancements in developing chemical compositions that play a crucial role in lithography processes used in semiconductor manufacturing.
Latest Patents
Among his latest inventions is a Novolak/DNQ based, chemically amplified photoresist. This invention presents a resist composition that includes a polymer component, a photoacid generator component (PAG), a photoactive diazonaphthoquinone component (PAC), and various other components. The composition is designed to enhance the performance of photoresists, making it suitable for both thick and thin film device manufacturing. The invention details specific features such as a Novolak derivative containing phenolic hydroxy moieties and acid-cleavable acetal moieties, which contribute to its efficacy. Another notable patent involves DNQ-type photoresist composition containing alkali-soluble acrylic resins, which facilitates the development of positive photoresist that is soluble in aqueous base.
Career Highlights
Weihong Liu has worked with renowned companies in the field of materials science, including Merck Patent GmbH and AZ Electronic Materials (Luxembourg) S.A.R.L. His expertise in the development of photolithographic materials has positioned him as a key figure in advancing technology within the semiconductor industry, contributing to the efficiency and effectiveness of photoresist applications.
Collaborations
Throughout his career, Liu has collaborated with esteemed colleagues, including Chunwei Chen and Medhat A Toukhy. These partnerships have facilitated the sharing of knowledge and expertise, leading to innovative solutions in the field of photoresist technology.
Conclusion
Weihong Liu stands out as a prominent inventor whose work in photoresist technology has significantly impacted semiconductor manufacturing. His impressive portfolio of patents showcases his dedication to innovation and his important role in advancing the field. As technology continues to evolve, the contributions of inventors like Liu will be essential in shaping future developments within the industry.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.