The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Jun. 15, 2012
Weihong Liu, Bridgewater, NJ (US);
Pinghung LU, Bridgewater, NJ (US);
Chunwei Chen, Bridgewater, NJ (US);
Stephen Meyer, Saylorsburg, PA (US);
Medhat Toukhy, Flemington, NJ (US);
Sookmee Lai, Kakegawa, JP;
Weihong Liu, Bridgewater, NJ (US);
PingHung Lu, Bridgewater, NJ (US);
Chunwei Chen, Bridgewater, NJ (US);
Stephen Meyer, Saylorsburg, PA (US);
Medhat Toukhy, Flemington, NJ (US);
SookMee Lai, Kakegawa, JP;
AZ Electronic Materials (Luxembourg) S.A.R.L., Luxembourg, LU;
Abstract
The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R-Rare, independently, —H or —CH, A is a linear or branched C-Calkylene group, B is a C-Calkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C-Calkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.