The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Jun. 15, 2012
Applicants:
Chunwei Chen, Bridgewater, NJ (US);
Pinghung LU, Bridgewater, NJ (US);
Weihong Liu, Bridgewater, NJ (US);
Medhat Toukhy, Flemington, NJ (US);
Sangchul Kim, Ansung-si, KR;
Sookmee Lai, Kakegawa, JP;
Inventors:
Chunwei Chen, Bridgewater, NJ (US);
PingHung Lu, Bridgewater, NJ (US);
Weihong Liu, Bridgewater, NJ (US);
Medhat Toukhy, Flemington, NJ (US);
SangChul Kim, Ansung-si, KR;
SookMee Lai, Kakegawa, JP;
Assignee:
AZ Electronic Materials (Luxembourg) S.A.R.L., Luxembourg, LU;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/028 (2006.01); G03F 7/075 (2006.01); G03F 7/40 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/028 (2013.01); G03F 7/0755 (2013.01); G03F 7/30 (2013.01); G03F 7/40 (2013.01); G03F 7/0757 (2013.01);
Abstract
Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.