Anseong, South Korea

SangChul Kim

This inventor holds 1 USPTO granted patent. Top assignee: Az Electronic Materials (Luxembourg) S.a.r.l.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: SangChul Kim. Retrieved from https://idiyas.com/inventor/sangchul-kim-pinuhva7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: SangChul Kim: Innovator in Photoresist Technology

Introduction

SangChul Kim is a notable inventor based in Anseong, South Korea. He has made significant contributions to the field of materials science, particularly in the development of photoresist technologies. His work has implications for various applications in electronics and manufacturing.

Latest Patents

SangChul Kim holds a patent for a negative-working thick film photoresist. This invention discloses compositions for negative-working thick film photoresists based on acrylic co-polymers. The patent also includes methods for utilizing these compositions effectively.

Career Highlights

Currently, SangChul Kim is associated with Az Electronic Materials (Luxembourg) S.a.r.l., where he continues to innovate in the field of electronic materials. His expertise in photoresist technology has positioned him as a key player in the industry.

Collaborations

Throughout his career, SangChul Kim has collaborated with esteemed colleagues such as Weihong Liu and Medhat A Toukhy. These partnerships have fostered advancements in research and development within their field.

Conclusion

SangChul Kim's contributions to photoresist technology exemplify the impact of innovation in materials science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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