The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Mar. 28, 2006
Georg Pawlowski, Bridgewater, NJ (US);
Chunwei Chen, Piscataway, NJ (US);
Joseph Oberlander, Phillipsburg, NJ (US);
Robert Plass, Belleville, NJ (US);
Georg Pawlowski, Bridgewater, NJ (US);
Chunwei Chen, Piscataway, NJ (US);
Joseph Oberlander, Phillipsburg, NJ (US);
Robert Plass, Belleville, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R' is selected independently from hydrogen, (C-C)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, Rto Rare independently selected from hydrogen, hydroxyl, (C-C) alkyl and chlorine, Xand Xare independently oxygen or N—R, where Ris hydrogen or (C-C) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.