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For the Inventor, By the Inventor

Hsinchu, Taiwan

Matt Yeh

This inventor holds 22 USPTO granted patents and 1 published patent application, primarily in Semiconductor Fabrication. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2010-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matt Yeh. Retrieved from https://idiyas.com/inventor/matt-yeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 22 

% Patents Active = 54.5

Average Co-Inventor Count = 4.5

ph-index = 8

Forward Citations = 142(Granted Patents)


Location History:

  • Hsinchu, TW (2010 - 2013)
  • Hsinchun, TW (2010 - 2016)

Company Filing History:

goldMedal22 out of 42,965 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2010-2016

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Areas of Expertise:
Gate Structure
High-K/Metal Devices
Resistor Techniques
Gate Replacement Process
FinFET Devices
Hard Mask Treatments
Gate Electrode Fabrication
Gate Oxide Leakage
Selective Etching
Dummy Poly Removal
Gate Thickness Control
Dielectric Layers
22 patents (USPTO):Explore Patents
1. 9362124 - Method of patterning a metal gate of semiconductor device (2016-06-07),
2. 8993452 - Method of patterning a metal gate of semiconductor device (2015-03-31),
3. 8980706 - Double treatment on hard mask for gate N/P patterning (2015-03-17),
4. 8658525 - Methods for a gate replacement process (2014-02-25),
5. 8569185 - Method of fabricating gate electrode using a treated hard mask (2013-10-29),
6. 8415254 - Method for removing dummy poly in a gate last process (2013-04-09),
7. 8367563 - Methods for a gate replacement process (2013-02-05),
8. 8361855 - Method for fabricating a gate structure (2013-01-29),
9. 8361848 - Precise resistor on a semiconductor device (2013-01-29),
10. 8357617 - Method of patterning a metal gate of semiconductor device (2013-01-22),
11. 8334197 - Method of fabricating high-k/metal gate device (2012-12-18),
12. 8329546 - Modified profile gate structure for semiconductor device and methods of forming thereof (2012-12-11),
13. 8268085 - Methods for forming metal gate transistors (2012-09-18),
14. 8222132 - Fabricating high-K/metal gate devices in a gate last process (2012-07-17),
15. 8173504 - Method of fabricating gate electrode using a treated hard mask (2012-05-08),

Title: The Innovative Journey of Matt Yeh

Introduction: Matt Yeh, a talented inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology with his creative and groundbreaking ideas.

Latest Patents: Matt Yeh holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: Throughout his career, Matt Yeh has worked with leading tech companies and research institutions, where he has spearheaded projects that have pushed the boundaries of innovation. His dedication to finding solutions to complex problems has earned him recognition in the industry.

Collaborations: Matt Yeh has collaborated with top scientists, engineers, and researchers from around the world, fostering a culture of innovation and knowledge-sharing. His ability to work effectively in multidisciplinary teams has led to the development of cutting-edge technologies.

Conclusion: Matt Yeh's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs. His impact on the tech industry is truly remarkable, and his legacy will undoubtedly endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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