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For the Inventor, By the Inventor

Kanagawa, Japan

Masatoshi Echigo

This inventor holds 65 USPTO granted patents and 78 published patent applications and 37 EPO patents, primarily in Lithography Materials (CPC class G03F). Top assignees: Mitsubishi Gas Chemical Company, Inc., Kansai University. Active years: 2005-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masatoshi Echigo. Retrieved from https://idiyas.com/inventor/masatoshi-echigo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 65 

% Patents Active = 60.0

 

Average Co-Inventor Count = 2.5

ph-index = 8

Forward Citations = 155(Granted Patents)

Forward Citations (Not Self Cited) = 63(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hiratsuka, JP (2005 - 2018)
  • Kanagawa, JP (2006 - 2019)
  • Tokyo, JP (2019 - 2023)

Company Filing History:

goldMedal65 out of 2,304 
 
Mitsubishi Gas Chemical Company, Inc.
 patents
silverMedal1 out of 99 
 
Kansai University
 patents
where one patent can have more than one assignee

Years Active: 2005-2026

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Areas of Expertise:
Lithography
Resist Composition
Pattern Formation
Purification Method
Underlayer Film
Radiation-Sensitive Composition
Compound
Resin
Film Formation
Production Method
Material
65 patents (USPTO):Explore Patents
1. 12735382 - Compound, (co)polymer, composition, method for forming pattern, and method for producing compound (2026-09-15),
2. 12699321 - Compound, (co)polymer, composition, method for forming resist pattern, method for producing compound, and method for producing (co)polymer (2026-08-04),
3. 12134596 - Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin (2024-11-05),
4. 11852970 - Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin (2023-12-26),
5. 11747728 - Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin (2023-09-05),
6. 11572430 - Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method (2023-02-07),
7. 11480877 - Resist composition, method for forming resist pattern, and polyphenol compound used therein (2022-10-25),
8. 11256170 - Compound, resist composition, and method for forming resist pattern using it (2022-02-22),
9. 11243467 - Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method (2022-02-08),
10. 11143962 - Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method (2021-10-12),
11. 11137686 - Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method (2021-10-05),
12. 11130724 - Compound, resin, composition, resist pattern formation method, and circuit pattern formation method (2021-09-28),
13. 11067889 - Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method (2021-07-20),
14. 10747112 - Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method (2020-08-18),
15. 10745372 - Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method (2020-08-18),

Title: The Innovative Journey of Masatoshi Echigo

Introduction: Masatoshi Echigo, a pioneering inventor hailing from Kanagawa, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Masatoshi Echigo holds several patents in the field of robotics and artificial intelligence, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Masatoshi Echigo has been at the forefront of developing cutting-edge solutions that have revolutionized industries. His work has not only garnered international recognition but has also paved the way for future innovations in the tech sector.

Collaborations: Throughout his career, Masatoshi Echigo has collaborated with leading research institutions, universities, and tech companies to further his research and bring his inventions to life. His collaborative efforts have resulted in the creation of groundbreaking technologies that have had a lasting impact on society.

Conclusion: Masatoshi Echigo's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a visionary inventor. His contributions to the field continue to inspire the next generation of innovators and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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