The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2022

Filed:

Mar. 02, 2016
Applicant:

Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;

Inventors:

Takumi Toida, Kanagawa, JP;

Masatoshi Echigo, Tokyo, JP;

Takashi Sato, Kanagawa, JP;

Youko Shimizu, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/30 (2006.01); C07C 39/17 (2006.01); C07D 493/04 (2006.01); C08G 8/14 (2006.01); C08G 10/02 (2006.01); C07B 61/00 (2006.01); C07D 311/92 (2006.01); C08G 61/12 (2006.01); C07C 37/20 (2006.01); C07C 39/14 (2006.01); C07C 39/225 (2006.01); C07C 39/42 (2006.01); C07D 311/78 (2006.01); C07D 311/96 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); C07B 61/00 (2013.01); C07C 37/20 (2013.01); C07C 39/14 (2013.01); C07C 39/17 (2013.01); C07C 39/225 (2013.01); C07C 39/42 (2013.01); C07D 311/78 (2013.01); C07D 311/92 (2013.01); C07D 311/96 (2013.01); C08G 8/14 (2013.01); C08G 10/02 (2013.01); C08G 61/12 (2013.01); G03F 7/004 (2013.01); G03F 7/0045 (2013.01); G03F 7/038 (2013.01); G03F 7/2039 (2013.01); G03F 7/327 (2013.01);
Abstract

The present invention is a compound represented by the following general formula (1).


Find Patent Forward Citations

Toida, Takumi. (2022). Resist composition, method for forming resist pattern, and polyphenol compound used therein (U.S. Patent No. 11480877). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11480877

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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