The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Aug. 23, 2016
Applicants:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
A School Corporation Kansai University, Suita, JP;
Inventors:
Hiroto Kudo, Suita, JP;
Masatoshi Echigo, Tokyo, JP;
Takumi Toida, Hiratsuka, JP;
Takashi Sato, Hiratsuka, JP;
Assignees:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
A School Corporation Kansai University, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 395/00 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 395/00 (2013.01); G03F 7/004 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0382 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01);
Abstract
A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin are provided. The compounds and materials can provide for high solubility in a safe solvent.