The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Sep. 02, 2016
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventor:
Masatoshi Echigo, Tokyo, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/021 (2006.01); C07D 303/28 (2006.01); C07C 43/23 (2006.01); G03F 7/11 (2006.01); C08L 63/00 (2006.01); G03F 7/09 (2006.01); C07B 61/00 (2006.01); H01L 21/311 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0217 (2013.01); C07C 43/23 (2013.01); C07D 303/28 (2013.01); C08L 63/00 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); C07B 61/00 (2013.01); C08L 2203/16 (2013.01); C08L 2312/04 (2013.01); H01L 21/0332 (2013.01); H01L 21/31116 (2013.01); H01L 21/31138 (2013.01);
Abstract
A compound represented by the following formula (1) and a method for producing the same, and a composition, a composition for optical component formation, a film forming composition for lithography, a resist composition, a method for forming a resist pattern, a radiation-sensitive composition, a method for producing an amorphous film, an underlayer film forming material for lithography, a composition for underlayer film formation for lithography, a method for producing an underlayer film for lithography, a resist pattern formation method, a circuit pattern formation method, and a purification method.