The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2022
Filed:
Mar. 02, 2016
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Takumi Toida, Kanagawa, JP;
Masatoshi Echigo, Tokyo, JP;
Takashi Sato, Kanagawa, JP;
Youko Shimizu, Kanagawa, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); C07D 311/78 (2006.01); G03F 7/30 (2006.01); C07D 493/04 (2006.01); C07C 37/72 (2006.01); C08G 8/14 (2006.01); C08G 10/02 (2006.01); C07D 311/00 (2006.01); C07D 307/77 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 37/72 (2013.01); C07D 307/77 (2013.01); C07D 311/00 (2013.01); C07D 311/78 (2013.01); C07D 493/04 (2013.01); C08G 8/14 (2013.01); C08G 10/02 (2013.01); G03F 7/004 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/20 (2013.01); G03F 7/16 (2013.01); G03F 7/30 (2013.01);
Abstract
The resist composition of the present invention contains one or more selected from compounds represented by specific formulae and resins obtained using these as monomers.