The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Dec. 23, 2019
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Tadashi Omatsu, Hiratsuka, JP;
Masahiro Matsumoto, Niigata, JP;
Michihiro Yuri, Niigata, JP;
Kentaro Kataoka, Niigata, JP;
Takashi Sato, Hiratsuka, JP;
Masatoshi Echigo, Tokyo, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 69/653 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
C07C 69/653 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/162 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract
The present invention has an object to provide a composition or the like capable of forming a film having high resolution and high sensitivity. The above object can be achieved by the following compound. An iodine-containing (meth)acrylate compound represented by the general formula (1): wherein
Omatsu, Tadashi. (2026). Compound, (co)polymer, composition, method for forming pattern, and method for producing compound (U.S. Patent No. 12735382). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12735382
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile