Nirasaki, Japan

Masaki Narushima


Average Co-Inventor Count = 2.7

ph-index = 9

Forward Citations = 1,160(Granted Patents)


Location History:

  • Sakaigawa-Mura, JP (2004)
  • Tokyo, JP (2006)
  • Higashiyatsushiro-gun, JP (2007)
  • Gilbert, AZ (US) (2008)
  • Yamanashi, JP (1990 - 2015)
  • Nirasaki, JP (2005 - 2015)

Company Filing History:


Years Active: 1990-2015

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15 patents (USPTO):Explore Patents

Title: Masaki Narushima: Innovator in Substrate Cleaning and Semiconductor Manufacturing

Introduction

Masaki Narushima is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the fields of substrate cleaning and semiconductor manufacturing, holding a total of 15 patents. His innovative approaches have advanced the technology used in these critical areas.

Latest Patents

Narushima's latest patents include a substrate cleaning method and a substrate cleaning device. The substrate cleaning method focuses on removing foreign materials attached to a substrate while preventing any deterioration of the substrate and any films formed on it. This method utilizes a cleaning gas at a pressure between 0.3 MPa and 2.0 MPa, which is sprayed towards a wafer with attached foreign material placed in a near-vacuum. The process produces clusters made up of numerous gas molecules that collide with the wafer without undergoing ionization.

Another notable patent is the substrate wiring method and semiconductor manufacturing device. This method involves embedding copper all the way to the lowest parts of a wiring pattern formed on a substrate. The process is conducted in a vacuum state and includes a preprocessing step where the wiring pattern is cleaned using a desired cleaning gas, followed by an embedding step where metal nanoparticles are embedded in the wiring pattern using a clustered metal gas.

Career Highlights

Throughout his career, Narushima has worked with notable companies such as Tokyo Electron Limited and Iwatani Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Narushima has collaborated with several talented individuals in his field, including Masahito Ozawa and Hiroaki Saeki. These collaborations have fostered an environment of innovation and have led to the development of advanced technologies.

Conclusion

Masaki Narushima's contributions to substrate cleaning and semiconductor manufacturing have made a significant impact on the industry. His innovative patents and collaborations with esteemed colleagues highlight his dedication to advancing technology in these fields.

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