The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2008

Filed:

Jul. 26, 2000
Applicants:

Hiroaki Saeki, Shirane-Machi, JP;

Masaki Narushima, Gilbert, AZ (US);

Tetsu Osawa, Sagamihara, JP;

Yasushi Taniyama, Toyohashi, JP;

Shuuji Hagiwara, Toyohashi, JP;

Inventors:

Hiroaki Saeki, Shirane-Machi, JP;

Masaki Narushima, Gilbert, AZ (US);

Tetsu Osawa, Sagamihara, JP;

Yasushi Taniyama, Toyohashi, JP;

Shuuji Hagiwara, Toyohashi, JP;

Assignee:

Tokyo Electron Limited, Tokyo-To, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a wafer transfer system wherein a wafer transfer robot linearly reciprocates by a linear motor, dust is prevented from adhering to a wafer. A fixed base, on which the secondary sideof a linear motor M for linearly reciprocating a wafer transfer robot R is mounted, is mounted on the system bodyof a wafer transfer system A in lateral directions and in vertical directions, so that dust dropping in accordance with the flow of clean air K from a clean air supply systemis directly sucked into an exhaust fan, which is provided on the bottom portionof the system body, to be exhausted without being deposited on the top face of the fixed baseand the secondary side


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