The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2004
Filed:
Mar. 05, 2003
Hiroaki Saeki, Shirane-Machi, JP;
Keiichi Matsushima, Kofu, JP;
Teruo Asakawa, Yamanashi-Ken, JP;
Masaki Narushima, Sakaigawa-Mura, JP;
Tokyo Electron Limited, Tokyo-to, JP;
Abstract
Two load lock chambers and are arranged between a first transfer chamber and a second transfer chamber . Each of the load lock chambers is capable of accommodating a single wafer W. The first transfer chamber is provided with a first transfer unit having two substrate holders each capable of holding a single object to be processed, in order to transport the wafer W among a load port site , the first load lock chamber , the second load lock chamber and a positioning unit . The second transfer chamber is provided with a second transfer unit having two substrate holders each capable of holding the single object to be processed, in order to transport the wafer between the first load lock chamber , the second load lock chamber and respective vacuum processing chambers to . Since the volume of each load lock chamber can be minimized, it is possible to perform the prompt control of atmospheres in the load lock chambers. Additionally, it is possible to perform the delivery of the wafers promptly.