The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
Aug. 29, 2002
Masaki Narushima, Nirasaki, JP;
Hiroaki Saeki, Nirasaki, JP;
Masaki Narushima, Nirasaki, JP;
Hiroaki Saeki, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A semiconductor processing system includes a common transfer chamber () having first and second compartments () partitioned by a partition wall (). First and second vacuum processing apparatuses (E,A) are respectively connected to the first and second compartments (). A pressure control section (PCS) controls the pressures inside the first and second compartments (). The pressure control section (PCS) includes first and second vacuum pumps () respectively connected to the first and second compartments (), and a line () connecting the delivery side of the second vacuum pump () to the suction side of the first vacuum pump (). The pressure control section (PCS) performs a setting such that a second ultimate pressure or lowest operational pressure of the second compartment () is lower than a first ultimate pressure or lowest operational pressure of the first compartment ().