Tokyo, Japan

Masaki Mikami

This inventor holds 16 USPTO granted patents and 5 EPO patents, primarily in EUV Lithography. Top assignees: Asahi Glass Company, Limited, Agc Inc., Other. Active years: 2004-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaki Mikami. Retrieved from https://idiyas.com/inventor/masaki-mikami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 81.3

 

Average Co-Inventor Count = 1.9

ph-index = 5

Forward Citations = 191(Granted Patents)


Location History:

  • Chiyoda-ku, JP (2010 - 2017)
  • Tokyo, JP (2004 - 2020)

Company Filing History:


Years Active: 2004-2020

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Areas of Expertise:
EUV Lithography
Reflective Mask Blank
Multilayer Film
Optical Member
Reflective Layer
Substrate
Production Process
Multilayer Mirror
Functional Film
Conductive Film
Mask Production
16 patents (USPTO):Explore Patents

Title: Masaki Mikami: Innovator in Multilayer Film Technology

Introduction

Masaki Mikami, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of multilayer film technology. With a total of 16 patents to his name, Mikami's work has played a critical role in advancing manufacturing techniques in the semiconductor and optics industries.

Latest Patents

Among his latest patents are innovative methods for manufacturing multilayer film-deposited substrates. One such method involves stacking a plurality of lamination units on a substrate while it rotates around a rotational axis perpendicular to its surface. This technique utilizes dry deposition processes to create complex multilayer structures. The patents detail specific requirements for deposition conditions, including time intervals and rates, allowing for precision in production.

Another notable patent is focused on a reflective mask blank for extreme ultraviolet (EUV) lithography. This invention emphasizes in-plane uniformity in both the peak reflectivity of light and the center wavelength of reflected light within the EUV wavelength region. The mask blank is engineered using a multilayer reflective film which includes alternating low and high refractive index layers, enhancing its effectiveness in EUV applications.

Career Highlights

Masaki Mikami has had an impressive career, contributing to significant advancements at well-known companies such as Asahi Glass Company, Limited. His work has not only resulted in numerous patents but also in the development of innovative products that are crucial in modern manufacturing lines. His deep expertise in film deposition techniques is widely recognized in the industry.

Collaborations

Throughout his career, Mikami has worked alongside esteemed colleagues, including Kazuyuki Hayashi and Takashi Sugiyama. Their collaborative efforts have led to further advancements and refinements in multilayer film technologies, demonstrating the importance of teamwork in innovation.

Conclusion

Masaki Mikami stands out as a leading inventor in the multilayer film industry, with a strong portfolio of patents that showcase his innovative capabilities. His contributions are invaluable to the fields of semiconductor manufacturing and EUV lithography, setting a benchmark for future advancements in technology. As innovations continue, Mikami's work will undoubtedly remain significant in shaping the future landscape of these industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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