The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2020
Filed:
Aug. 02, 2017
Method for manufacturing multilayer film-deposited substrate and multilayer film-deposited substrate
Agc Inc., Chiyoda-ku, JP;
AGC Inc., Chiyoda-ku, JP;
Abstract
A method for manufacturing a multilayer film-deposited substrate includes stacking a plurality of lamination units on the substrate while rotating the substrate around a rotational axis perpendicular to a substrate surface. Each of the lamination units has a plurality of layers formed by a dry deposition process. When a plurality of the multilayer film-deposited substrates are manufactured by the dry deposition process, a deposition is performed in a condition satisfying at least one of the following requirements (1) and (2), with estimating a change with time in a deposition rate: [T/T<(m−0.02) or (m+0.02)<T/T] (1), and [(n−0.02)≤T/T≤(n+0.02)] (2). m and n are independently any integer. Tis a time interval between the depositions among each layer of the plurality of layers. Tis a deposition unit time required for depositing the one lamination unit. Tis a rotation period of the substrate.