Company Filing History:
Years Active: 2020
Title: Yunosuke Ishikawa: Innovator in Multilayer Film Technology
Introduction
Yunosuke Ishikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of multilayer film technology. His innovative approach has led to the development of a unique method for manufacturing multilayer film-deposited substrates.
Latest Patents
Ishikawa holds a patent for a "Method for manufacturing multilayer film-deposited substrate and multilayer film-deposited substrate." This method involves stacking multiple lamination units on a substrate while rotating it around a rotational axis that is perpendicular to the substrate surface. Each lamination unit consists of several layers formed through a dry deposition process. The patent outlines specific conditions for deposition, ensuring optimal results in the manufacturing process.
Career Highlights
Yunosuke Ishikawa has been instrumental in advancing multilayer film technology. His work at AGC Inc. has positioned him as a key figure in the industry. With a focus on innovation, he has successfully developed methods that enhance the efficiency and quality of multilayer film production.
Collaborations
Ishikawa collaborates with talented individuals such as Masaki Mikami and Makoto Kurumisawa. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Yunosuke Ishikawa's contributions to multilayer film technology exemplify the spirit of innovation. His patented methods and collaborative efforts continue to influence the industry positively.