Company Filing History:

12 out of 1,058

Jsr Corporation

patents

2 out of 377

Japan Synthetic Rubber Co., Ltd.

patents

Years Active: 1997-2013

Loading Chart...

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8404786 - Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same (2013-03-26),

2. 8268403 - Method for forming organic silica film, organic silica film, wiring structure, semiconductor device, and composition for film formation (2012-09-18),

3. 8017700 - Polycarbosilane, method for producing same, silica composition for coating application, and silica film (2011-09-13),

4. 7893538 - Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device (2011-02-22),

5. 7875317 - Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same (2011-01-25),

6. 7736748 - Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same (2010-06-15),

7. 7556860 - Laminate and method of forming the same, insulating film, and semiconductor device (2009-07-07),

8. 7528207 - Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film (2009-05-05),

9. 7462678 - Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film (2008-12-09),

10. 7358317 - Polycarbosilane and method of producing the same (2008-04-15),

11. 7291567 - Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device (2007-11-06),

12. 6007961 - Radiation-sensitive resin composition (1999-12-28),

13. 5958645 - Radiation-sensitive resin composition (1999-09-28),

14. 5672459 - Radiation sensitive resin composition containing quinone diazide ester (1997-09-30),

Title: Masahiro Akiyama: Innovator in Polymer and Film Technologies

Introduction

Masahiro Akiyama is a prominent inventor based in Tsukuba, Japan. He has made significant contributions to the fields of polymer science and film technology. With a total of 14 patents to his name, Akiyama has established himself as a key figure in innovation.

Latest Patents

Akiyama's latest patents include a process for producing a polymer that involves mixing a polysiloxane compound and a polycarbosilane compound in the presence of a catalyst, water, and an organic solvent, followed by heating the mixture. Another notable patent is for a method of forming an organic silica film, which includes creating a coating with specific silicon compound structures on a substrate, heating the coating, and curing it using ultraviolet radiation.

Career Highlights

Throughout his career, Akiyama has worked with leading companies such as JSR Corporation and Japan Synthetic Rubber Co., Ltd. His work has been instrumental in advancing technologies related to insulating films and semiconductor devices.

Collaborations

Akiyama has collaborated with notable colleagues, including Hisashi Nakagawa and Atsushi Shiota. Their combined expertise has contributed to the success of various projects in the field.

Conclusion

Masahiro Akiyama's innovative work in polymer and film technologies has made a lasting impact on the industry. His patents reflect a commitment to advancing scientific knowledge and practical applications.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com