The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2008

Filed:

Sep. 23, 2004
Applicants:

Masahiro Akiyama, Tsukuba-shi, JP;

Seitaro Hattori, Tsukuba-shi, JP;

Masaki Obi, Ageo-shi, JP;

Koichi Hasegawa, Champaign, IL (US);

Inventors:

Masahiro Akiyama, Tsukuba-shi, JP;

Seitaro Hattori, Tsukuba-shi, JP;

Masaki Obi, Ageo-shi, JP;

Koichi Hasegawa, Champaign, IL (US);

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for producing a film forming composition, the process including hydrolyzing and condensing: (A) at least one silane compound selected from a compound (A-1) shown by the following general formula (1), a compound (A-2) shown by the following general formula (2), and a compound (A-3) shown by the following general formula (3),RSi(OR)  (1)Si(OR)  (2)R(RO)Si—(R)—Si(OR)R  (3); and (B) a cyclic silane compound shown by the following general formula (4):


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