The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Apr. 28, 2005
Applicants:
Masahiro Akiyama, Tsukuba, JP;
Hisashi Nakagawa, Tsukuba, JP;
Tatsuya Yamanaka, Yokkaichi, JP;
Atsushi Shiota, Ushiku, JP;
Takahiko Kurosawa, Tsukuba, JP;
Inventors:
Masahiro Akiyama, Tsukuba, JP;
Hisashi Nakagawa, Tsukuba, JP;
Tatsuya Yamanaka, Yokkaichi, JP;
Atsushi Shiota, Ushiku, JP;
Takahiko Kurosawa, Tsukuba, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming an organic silica film includes forming a coating including a silicon compound having an —Si—O—Si— structure and an —Si—CH—Si— structure on a substrate, heating the coating, and curing the coating by applying ultraviolet radiation.