The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 1997

Filed:

Mar. 22, 1996
Applicant:
Inventors:

Katsumi Inomata, Yokkaichi, JP;

Masahiro Akiyama, Yokkaichi, JP;

Toshiyuki Ota, Tsukuba, JP;

Akira Tsuji, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430191 ; 430192 ; 430193 ;
Abstract

The present invention provides a radiation sensitive resin composition which contains an alkali soluble resin and a 1,2-quinonediazide compound represented by the following formula, for example. ##STR1## The radiation sensitive resin composition of the present invention has an excellent developability, provides an excellent pattern shape, is superior in sensitivity and resolution, and has greatly improved focus latitude and heat resistance in particular. Therefore, the radiation sensitive resin composition of the present invention can be suitably used as a resist for the production of LSIs.


Find Patent Forward Citations

Inomata, Katsumi. (1997). Radiation sensitive resin composition containing quinone diazide ester (U.S. Patent No. 5672459). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5672459

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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