Yokkaichi, Japan

Akira Tsuji


Average Co-Inventor Count = 4.1

ph-index = 8

Forward Citations = 238(Granted Patents)


Location History:

  • Yokohama, JP (1999)
  • Yokkaichi, JP (1983 - 2001)

Company Filing History:


Years Active: 1983-2001

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13 patents (USPTO):Explore Patents

Title: Akira Tsuji: Innovator in Radiation Sensitive Resin Compositions

Introduction

Akira Tsuji is a prominent inventor based in Yokkaichi, Japan, known for his significant contributions to the field of radiation sensitive resin compositions. With a total of 13 patents to his name, Tsuji has made remarkable advancements that have impacted the semiconductor industry.

Latest Patents

Among his latest patents, Tsuji has developed a radiation sensitive resin composition that includes a polymer which becomes alkali-soluble in the presence of an acid, along with a radiation sensitive acid generator. This innovative composition is designed to enhance the performance of semiconductor devices. Another notable patent is the chemically amplified resist composition, which features a combination of blocked resins, alkali-soluble resins, and photoacid generators. These compositions exhibit superior sensitivity, high resolution capability, and excellent storage stability, making them ideal for producing finely shaped patterns on large substrates through spin coating.

Career Highlights

Throughout his career, Akira Tsuji has worked with reputable companies such as Japan Synthetic Rubber Co., Ltd. and JSR Corporation. His work has been instrumental in advancing technologies related to semiconductor manufacturing.

Collaborations

Tsuji has collaborated with notable colleagues, including Toshiyuki Ota and Eiichi Kobayashi, contributing to the development of innovative solutions in his field.

Conclusion

Akira Tsuji's contributions to radiation sensitive resin compositions have significantly influenced the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in this specialized area.

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