The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 1998

Filed:

Feb. 02, 1996
Applicant:
Inventors:

Mikio Yamachika, Kuwana, JP;

Masatoshi Kusama, Tsurugashima, JP;

Yasutaka Kobayashi, Yokkaichi, JP;

Akira Tsuji, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
4302701 ;
Abstract

A chemically amplified, radiation-sensitive resin composition which comprises a radiation-sensitive acid-generator which generates an acid upon irradiation with a radiation and in which the chemical change due to the catalytic action of said acid changes the solubility of the irradiated portion in a developer to form a pattern, characterized by comprising an anthracene derivative of the formula (1), representatives of which are anthracene-9-methanol and anthracene-9-carboxyethyl.


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