Yokkaichi, Japan

Toshiyuki Ota


Average Co-Inventor Count = 4.2

ph-index = 9

Forward Citations = 254(Granted Patents)


Location History:

  • Yokkaichi, JP (1994 - 2000)
  • Tokyo, JP (2000)
  • Seoul, KR (2001)
  • Tsukuba, JP (1997 - 2004)

Company Filing History:


Years Active: 1994-2004

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19 patents (USPTO):Explore Patents

Title: The Innovative Mind of Toshiyuki Ota

Introduction: Toshiyuki Ota, an esteemed inventor based in Yokkaichi, Japan, has made significant contributions to the field of chemistry and materials science. With a remarkable portfolio of 19 patents, his work predominantly revolves around radiation-sensitive resin compositions, showcasing his pioneering spirit and commitment to innovation.

Latest Patents: Among his latest patents, Toshiyuki Ota has developed a groundbreaking radiation-sensitive resin composition that includes (A) a resin featuring an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent. This composition stands out for its excellent transparency concerning radiation and dry etching resistance. Moreover, it enables the creation of a photoresist pattern that excels in adhesion to substrates, sensitivity, resolution, and developability.

Career Highlights: Throughout his career, Toshiyuki Ota has been associated with notable companies, including Japan Synthetic Rubber Co., Ltd. and JSR Corporation. His work in these organizations has allowed him to harness his expertise in polymer chemistry and contribute to the development of advanced materials.

Collaborations: Collaboration has played a vital role in Toshiyuki Ota's journey. He has had the opportunity to work alongside talented individuals, including Akira Tsuji and Eiichi Kobayashi. Together, they have pushed the boundaries of innovation, driving forward the development of new technologies and materials.

Conclusion: Toshiyuki Ota's contributions to the field of radiation-sensitive resin compositions highlight his innovative thinking and dedication to advancing technology. As an inventor with numerous patents to his name, he continues to inspire future generations in the realms of chemistry and materials science. His collaborations and career achievements underscore the importance of teamwork in driving innovation forward.

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