This inventor holds 16 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Lithography Technology. Top assignee: Nikon Corporation. Active years: 1995-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo-To, JP (2006)
- Tokyo, JP (1995 - 2014)
- Setagaya-ku, JP (2015)
Company Filing History:
Years Active: 1995-2015
Areas of Expertise:
Title: The Innovations of Masahiko Okumura
Introduction
Masahiko Okumura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of lithography, particularly in the development of immersion lithographic apparatuses. With a total of 16 patents to his name, Okumura's work has had a profound impact on the manufacturing of semiconductor devices.
Latest Patents
One of Okumura's latest patents is titled "Immersion lithographic apparatus rinsing outer contour of substrate with immersion space." This invention involves an immersion type lithographic apparatus that includes at least one immersion space and an immersion system designed to partially fill the immersion space with a liquid. The apparatus is specifically configured to rinse part of the immersion space with a rinsing liquid before projecting a patterned beam of radiation onto a substrate. Another notable patent is "Exposure apparatus, exposure method, and device manufacturing method." This exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. It exposes a substrate via an optical member and a liquid, with the liquid immersion system performing the supply and recovery of the liquid.
Career Highlights
Masahiko Okumura has had a distinguished career at Nikon Corporation, where he has been instrumental in advancing lithographic technology. His innovative approaches have led to the development of cutting-edge equipment that enhances the precision and efficiency of semiconductor manufacturing processes.
Collaborations
Okumura has collaborated with notable colleagues, including Kenji Nishi and Yoshiki Kida. Their combined expertise has contributed to the success of various projects within Nikon Corporation.
Conclusion
Masahiko Okumura's contributions to the field of lithography are significant and continue to influence the semiconductor industry. His innovative patents and collaborative efforts exemplify the spirit of invention and advancement in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile