The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2000

Filed:

Dec. 07, 1998
Applicant:
Inventors:

Shigeru Yamasaki, Kumagaya, JP;

Masahiko Okumura, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 67 ;
Abstract

In a projection exposure apparatus and method in which a substrate is exposed with a projected image of a mask through a projection optical system, a table which is movable in a direction of an optical axis of the projection optical system in arranged at an image side of the projection optical system to hold the substrate. A tilt amount of the table is monitored, and position information of a mark on the table is detected, which changes in accordance with the tilt of the table. Information on the relationship between a displacement amount of the substrate and a plane perpendicular to the optical axis and the tilt angle of the substrate is obtained, based on the monitored tilt amount and the position information of the mark.

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Yamasaki, Shigeru. (2000). Projection exposure apparatus and method (U.S. Patent No. 6122036). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6122036

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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