The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2015
Filed:
Jun. 09, 2008
Applicants:
Katsushi Nakano, Kumagaya, JP;
Masahiko Okumura, Setagaya-ku, JP;
Tarou Sugihara, Shinagawa-ku, JP;
Takeyuki Mizutani, Kumagaya, JP;
Tomoharu Fujiwara, Ageo, JP;
Inventors:
Katsushi Nakano, Kumagaya, JP;
Masahiko Okumura, Setagaya-ku, JP;
Tarou Sugihara, Shinagawa-ku, JP;
Takeyuki Mizutani, Kumagaya, JP;
Tomoharu Fujiwara, Ageo, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2041 (2013.01); G03F 7/38 (2013.01); G03F 7/70341 (2013.01); G03F 7/70925 (2013.01);
Abstract
An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.