The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Mar. 04, 2008
Michael R. Sogard, Menlo Park, CA (US);
Bausan Yuan, San Jose, CA (US);
Masahiko Okumura, Tokyo, JP;
Yosuke Shirata, Saitama, JP;
Kiyoshi Uchikawa, Tsukuba, JP;
Saburo Kamiya, Tokyo, JP;
Akikazu Tanimoto, Yokohama, JP;
Michael R. Sogard, Menlo Park, CA (US);
Bausan Yuan, San Jose, CA (US);
Masahiko Okumura, Tokyo, JP;
Yosuke Shirata, Saitama, JP;
Kiyoshi Uchikawa, Tsukuba, JP;
Saburo Kamiya, Tokyo, JP;
Akikazu Tanimoto, Yokohama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.