Saburo Kamiya, based in Ageo, Japan, is a prominent inventor known for his groundbreaking contributions to the field of measurement technology. With a remarkable portfolio of 22 patents, Kamiya has significantly influenced the development of precision instruments and systems in the semiconductor and lithography industries. His technical expertise and inventive insights have earned him a reputable place in the innovation landscape.

Latest Patents

Saburo Kamiya's latest inventions include two prominent patents that showcase his ingenuity:

1. **Interferometric Position-Measuring Devices and Methods**

This invention comprises process tools and methods involving interferometric and other measurements to ascertain movements and positions relative to a defined process position. An exemplary apparatus includes a stage that positions a workpiece in relation to the tool and is movable in at least one direction. The innovative setup includes a first interferometer system that assesses the stage's position in the movement direction, combined with a movement-measuring device to determine the tool's displacement. The data from both systems is processed to accurately determine and correct the stage's position relative to the tool.

2. **Exposure Apparatus and Production Method of Device Using the Same**

This patent outlines an exposure apparatus designed to transfer a pattern image from a mask onto a substrate through a projection optical system. It consists of a substrate table that supports the substrate, a first sensor to measure the gap between the substrate surface and a control target position, and a second sensor to measure the distance between the projection optical system and the substrate table along the optical axis direction. This invention enhances accuracy in lithographic processes by adjusting the control target position based on sensor data.

Career Highlights

Saburo Kamiya's work at Nikon Corporation, a leading multinational corporation specializing in optics and imaging products, has been marked by significant technological advancements in lithography and measurement systems. His commitment to innovation within this competitive field has led to the successful development of critical tools that assist in high-precision manufacturing processes, particularly in the semiconductor industry.

Collaborations

Throughout his career, Kamiya has collaborated with esteemed colleagues such as Akikazu Tanimoto and Naomasa Shiraishi. These partnerships have fostered a collaborative environment that enhances creativity and drives technological progress, showcasing the power of teamwork in the realm of innovation.

Conclusion

Saburo Kamiya's contributions to the field of interferometric measurement technologies and exposure apparatus systems exemplify the impact of innovative thinking in advancing industrial capabilities. His patents not only reflect his ingenuity but also significantly enhance precision in critical manufacturing processes, ensuring continued development in the high-tech sector. As a key player at Nikon Corporation, Kamiya's work serves as an inspiring example of how inventors can influence emerging technologies and shape the future of their industries.

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