The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2004
Filed:
Sep. 13, 2000
Applicant:
Inventor:
Saburo Kamiya, Ageo, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 ;
U.S. Cl.
CPC ...
G01B 9/02 ;
Abstract
An exposure apparatus which transfers a pattern image formed on a mask on to a substrate through a projection optical system, comprising a substrate table which holds said substrate, a first sensor which measures a gap between said substrate surface held by said substrate table and a control target position, and a second sensor which measures a distance between said projection optical system and said substrate table in an optical axis direction and corrects the control target position of said first sensor.
Kamiya, Saburo. (2004). Exposure apparatus and device production method in which position of reference plate provided on substrate stage is measured (U.S. Patent No. 6741358). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6741358
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