The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2007
Filed:
Jul. 17, 2003
Alex Ka Tim Poon, San Ramon, CA (US);
Leonard Wai Fung Kho, San Francisco, CA (US);
Toru Kawaguchi, Saitama, JP;
Hisashi Tazawa, Saitama, JP;
Saburo Kamiya, Saitama, JP;
Yasuhiro Hidaka, Kumagaya, JP;
Alex Ka Tim Poon, San Ramon, CA (US);
Leonard Wai Fung Kho, San Francisco, CA (US);
Toru Kawaguchi, Saitama, JP;
Hisashi Tazawa, Saitama, JP;
Saburo Kamiya, Saitama, JP;
Yasuhiro Hidaka, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A measurement system () for measuring the position of a stage () along a first axis includes a first system () having a first beam source (A) that directs a first beam (H) on a first path that is parallel with a second axis and a first redirector (D) that redirects the first beam so that the redirected first beam (H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (D) about a third axis. The measurement system () can include a shield () that protects the first beam (H) from environmental conditions.