The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Oct. 25, 2005
Katsushi Nakano, Kumagaya, JP;
Masahiko Okumura, Tokyo, JP;
Tarou Sugihara, Tokyo, JP;
Takeyuki Mizutani, Kumagaya, JP;
Tomoharu Fujiwara, Ageo, JP;
Katsushi Nakano, Kumagaya, JP;
Masahiko Okumura, Tokyo, JP;
Tarou Sugihara, Tokyo, JP;
Takeyuki Mizutani, Kumagaya, JP;
Tomoharu Fujiwara, Ageo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced.