The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 1998
Filed:
Oct. 15, 1996
Masahiko Okumura, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus is designed to reduce the influences of alignment errors due to dynamic fluctuations and improve the throughput while basically using an off-axis alignment scheme. A wafer stage on which a test wafer is place is step-driven in accordance with a shot arrangement in an exposure operation. Subsequently, variations in position of the wafer stage, which occur while the position of alignment marks observed by a TTR alignment system coincide with aimed positions, are stored. In an exposure operation with respect to a wafer to be exposed, the prestored variations in position of the wafer stage are reproduced when alignment of each shot area is performed in accordance with the position of each alignment mark, detected by an off-axis alignment system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile