Oakland, CA, United States of America

Mark Henry Wilcoxson

This inventor holds 34 USPTO granted patents and 7 published patent applications and 4 EPO patents, primarily in Semiconductor Processing. Top assignees: Lam Research Corporation, Lab Research Corporation. Active years: 2002-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Henry Wilcoxson. Retrieved from https://idiyas.com/inventor/mark-henry-wilcoxson

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 34 

% Patents Active = 44.1


Average Co-Inventor Count = 4.2

ph-index = 10

Forward Citations = 453(Granted Patents)


Location History:

  • Piedmont, CA (US) (2002 - 2008)
  • Oakland, CA (US) (2008 - 2019)

Company Filing History:


Years Active: 2002-2019

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Areas of Expertise:
Dielectric Etch
Wafer Cleaning
Atomic Layer Deposition
High Aspect Ratio
Substrate Processing
Plasma Treatment
Contaminant Removal
Pattern Collapse
Multi-Stage Cleaning
Surface Treatment
Process Uniformity
Metal Passivation
34 patents (USPTO):Explore Patents

Title: The Innovative Mind of Mark Henry Wilcoxson

Introduction

Mark Henry Wilcoxson from Oakland, CA, is a prolific inventor with an impressive portfolio of 34 patents to his name. His focus on semiconductor technologies has led to significant advancements in the field, showcasing his expertise and innovative spirit.

Latest Patents

Among his most recent contributions to technology are two notable patents. The first is a "Mask Shrink Layer for High Aspect Ratio Dielectric Etch", which introduces methods and systems for creating recessed features in dielectric-containing stacks on semiconductor substrates. This invention involves the deposition of a mask shrink layer through processes like atomic layer deposition or chemical vapor deposition, resulting in narrower and more vertically uniform etched features. In various embodiments, etching can be achieved in a single step or through multiple stages that include deposition steps for protective sidewall coatings.

The second is a "Technique to Deposit Metal-Containing Sidewall Passivation for High Aspect Ratio Cylinder Etch". This patent describes a cyclic approach combining separate etching and deposition operations to form recessed features in dielectric materials. Each etching operation is carefully executed to minimize lateral etch damage, while protective coatings—typically metal-containing—are applied to the sidewalls to enhance resistance during the etching process.

Career Highlights

Mark Henry Wilcoxson has demonstrated his skills and knowledge while working for leading companies such as Lam Research Corporation and Lab Research Corporation. His contributions to these organizations have been crucial in advancing the capabilities of semiconductor manufacturing technologies and in improving the precision of etching processes.

Collaborations

Throughout his career, Mark has had the opportunity to collaborate with talented professionals, including Andrew D. Bailey, III and Eric A. Hudson. These collaborations have not only enriched his work experience but also contributed to the innovation landscape in the tech sector through shared insights and discoveries.

Conclusion

Mark Henry Wilcoxson's innovative designs and inventions underscore the importance of creativity and technical knowledge in the rapidly evolving field of semiconductor technology. With 34 patents to his name and a commitment to excellence, he continues to be a significant contributor to advancements that shape the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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