The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Mar. 13, 2008
Seokmin Yun, Pleasanton, CA (US);
Ji Zhu, El Cerrito, CA (US);
John M. Delarios, Palo Alto, CA (US);
Mark Wilcoxson, Oakland, CA (US);
Seokmin Yun, Pleasanton, CA (US);
Ji Zhu, El Cerrito, CA (US);
John M. deLarios, Palo Alto, CA (US);
Mark Wilcoxson, Oakland, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method and system for cleaning a surface of a substrate after an etching operation includes determining a plurality of process parameters associated with the surface of the substrate. A plurality of application chemistries are identified based on the process parameters. The plurality of application chemistries includes a first application chemistry as an emulsion having a first immiscible liquid combined with a second immiscible liquid and solid particles distributed within the first immiscible liquid. The plurality of application chemistries including the first application chemistry are applied to the surface of the substrate such that the combined chemistries enhance the cleaning process by substantially removing the particulate and polymer residue contaminants from the surface of the substrate while preserving the characteristics of the features and of the low-k dielectric material through which the features are formed.