Palo Alto, CA, United States of America

John M deLarios

USPTO Granted Patents = 24 

Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 178(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2013)
  • Palo Alto, CA (US) (1998 - 2016)

Company Filing History:


Years Active: 1998-2016

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24 patents (USPTO):

Title: The Innovative Journey of John M deLarios in Semiconductor Cleaning Technologies

Introduction

John M deLarios, based in Palo Alto, California, has made significant contributions to the field of semiconductor technologies. With an impressive portfolio of 24 patents, his work primarily focuses on methods for cleaning substrates after etching operations, enhancing both efficiency and performance in manufacturing processes.

Latest Patents

Among his latest innovations, deLarios has developed a comprehensive **Method of Dielectric Film Treatment**. This method outlines a systematic approach to cleaning substrate surfaces post-etching, utilizing a range of application chemistries. One notable component includes an emulsion formed from two immiscible liquids and solid particles, all designed to effectively remove contaminants while preserving the integrity of low-k dielectric materials. Another pivotal patent is the **Method for Removing Contamination from a Substrate and for Making a Cleaning Solution**. This technique involves a sophisticated cleaning solution that enhances the interaction between cleaning particles and surface contaminants, leading to more effective removal and maintained substrate quality.

Career Highlights

deLarios has built a robust career in the semiconductor industry, holding important positions at notable companies such as Lam Research Corporation and Genus, Inc. His contributions have not only propelled advancements in substrate cleaning methods but have also fostered innovation within the teams he has been part of.

Collaborations

Throughout his career, deLarios has had the opportunity to collaborate with talented professionals, including Michael Ravkin and Katrina Mikhaylichenko. These collaborations have allowed him to refine his ideas and bring forth groundbreaking technologies that serve the semiconductor manufacturing sector.

Conclusion

In summary, John M deLarios is a prominent figure in the realm of semiconductor innovations. His extensive patent portfolio underscores his commitment to enhancing cleaning processes that are vital for maintaining the quality and performance of electronic components. As he continues to innovate, the industry eagerly anticipates his future contributions.

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