The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
Dec. 11, 2007
Seokmin Yun, Pleasanton, CA (US);
John M. Boyd, Ataseadero, CA (US);
Mark Wilcoxson, Oakland, CA (US);
John Delarios, Palo Alto, CA (US);
Seokmin Yun, Pleasanton, CA (US);
John M. Boyd, Ataseadero, CA (US);
Mark Wilcoxson, Oakland, CA (US);
John deLarios, Palo Alto, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface of the substrate and an opposing surface of the proximity head. The substrate is linearly moved under the proximity head. A single wafer cleaning system is also provided.