The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
May. 02, 2007
Erik M. Freer, Campbell, CA (US);
John M. Delarios, Palo Alto, CA (US);
Michael Ravkin, Sunnyvale, CA (US);
Mikhail Korolik, San Jose, CA (US);
Fritz C. Redeker, Fremont, CA (US);
Erik M. Freer, Campbell, CA (US);
John M. deLarios, Palo Alto, CA (US);
Michael Ravkin, Sunnyvale, CA (US);
Mikhail Korolik, San Jose, CA (US);
Fritz C. Redeker, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method and system for cleaning opposed surfaces of a semiconductor wafer having particulate matter thereon. The method includes generating relative movement between a fluid and the substrate. The relative movement is in a direction that is transverse to a normal to one of the opposed surfaces and creates two spaced-apart flows. Each of the flows is adjacent to one of the opposed surfaces that is different from the opposed surface that is adjacent to the remaining flow of the plurality of flows. The fluid has coupling elements entrained therein, and the relative movement is established to impart sufficient drag upon a subset of the coupling elements to create movement of the coupling elements of the subset within the fluid. In this manner, a quantity of the drag is imparted upon the particulate matter to cause the particulate matter to move with respect to the substrate.