Mikhail Korolik

Title: The Innovations of Mikhail Korolik in Semiconductor Technology

Introduction

Mikhail Korolik, based in San Jose, California, is an accomplished inventor and innovator with an impressive portfolio of 66 patents. His contributions to semiconductor technology have significantly advanced the field, particularly in etching processes and materials.

Latest Patents

Mikhail Korolik's recent patents showcase cutting-edge methods for etching germanium-containing materials and silicon materials. One innovative method involves creating a plasma from a fluorine-containing precursor within a specialized semiconductor processing chamber. This process includes flowing effluents through apertures in a chamber component, which may be coated with catalytic material to effectively manage the concentration of fluorine radicals.

Another notable patent details methods for selective etching of silicon materials using hydrogen fluoride (HF) gas, eliminating the need for nitrogen etchants. This process enables precise removal of silicon material within device structures, showcasing Mikhail's ability to simplify and improve semiconductor applications.

Career Highlights

Throughout his career, Mikhail Korolik has held significant positions in renowned companies such as Lam Research Corporation and Applied Materials, Inc. His tenure at these institutions has allowed him to refine his expertise and contribute to transformative innovations in semiconductor processing technologies.

Collaborations

Collaboration has been key to Mikhail's success as an inventor. He has worked alongside esteemed colleagues such as John Martin de Larios and Michael Ravkin, contributing to joint efforts that have propelled advancements in semiconductor technologies. These partnerships highlight the importance of teamwork in pioneering new methods and overcoming technical challenges in the industry.

Conclusion

Mikhail Korolik's work in the field of semiconductor technology and his extensive patent portfolio underscore his role as a leading innovator. His latest contributions to germanium etching systems and methods for silicon etching demonstrate his dedication to advancing semiconductor processing techniques, reinforcing his status as a prominent figure in the innovation landscape.