Ji Zhu

Title: Innovations of Ji Zhu: A Pioneer in Substrate Processing

Introduction

Ji Zhu is a notable inventor based in El Cerrito, California, known for his significant contributions to the field of substrate processing. With an impressive portfolio of 25 patents, he has been at the forefront of developing innovative techniques for efficient cleaning and etching of high aspect ratio structures.

Latest Patents

Among his latest patents is a method for treating substrates, which involves the arrangement of a substrate in a processing chamber. This process includes supplying a vaporized solvent or a gas mixture that forms a conformal liquid layer on the substrate's exposed surfaces. The invention highlights the importance of a reactive gas, including halogen species, that adsorbs onto the conformal liquid layer, enabling the etching of the substrate effectively.

Additionally, Zhu has patented a gas mixture containing hydrogen fluoride, alcohol, and an additive that prevents stiction and repairs high aspect ratio structures. This innovative gas mixture is essential for treating high aspect ratio structures arranged on a substrate's surface, showcasing his expertise in addressing complex manufacturing challenges.

Career Highlights

Ji Zhu has made significant strides in his career, holding positions at reputable organizations such as Lam Research Corporation and the University of California. His work has not only advanced the field of substrate processing but also enhanced the efficiency and effectiveness of manufacturing practices in semiconductor technologies.

Collaborations

Throughout his career, Zhu has collaborated with esteemed colleagues, including Arjun Mendiratta and David S. Mui. These partnerships have fostered an environment of innovation, allowing them to collectively push the boundaries of what is possible in substrate treatment solutions.

Conclusion

With an impressive array of patents and a dedicated career in substrate processing, Ji Zhu exemplifies the spirit of innovation within the technology sector. His contributions continue to pave the way for advancements in efficient cleaning and etching techniques, making a significant impact on the industry.