The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Feb. 01, 2010
Amir A. Yasseri, San Jose, CA (US);
Ji Zhu, El Cerrito, CA (US);
Seokmin Yun, Pleasanton, CA (US);
David S. L. Mui, Fremont, CA (US);
Katrina Mikhaylichenko, San Jose, CA (US);
Amir A. Yasseri, San Jose, CA (US);
Ji Zhu, El Cerrito, CA (US);
Seokmin Yun, Pleasanton, CA (US);
David S. L. Mui, Fremont, CA (US);
Katrina Mikhaylichenko, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method is provided for treating the surface of high aspect ratio nanostructures to help protect the delicate nanostructures during some of the rigorous processing involved in fabrication of semiconductor devices. A wafer containing high aspect ratio nanostructures is treated to make the surfaces of the nanostructures more hydrophobic. The treatment may include the application of a primer that chemically alters the surfaces of the nanostructures preventing them from getting damaged during subsequent wet clean processes. The wafer may then be further processed, for example a wet cleaning process followed by a drying process. The increased hydrophobicity of the nanostructures helps to reduce or prevent collapse of the nanostructures.