Fremont, CA, United States of America

David S L Mui

USPTO Granted Patents = 13 

Average Co-Inventor Count = 4.1

ph-index = 7

Forward Citations = 993(Granted Patents)


Location History:

  • San Jose, CA (US) (2004)
  • Fremont, CA (US) (2005 - 2013)

Company Filing History:


Years Active: 2004-2013

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13 patents (USPTO):Explore Patents

Title: Inventor Spotlight: David S. L. Mui from Fremont, CA

Introduction

David S. L. Mui is a prominent inventor based in Fremont, California. With a total of 13 patents to his name, he has made significant contributions to the field of semiconductor device fabrication techniques. His innovative methods focus on enhancing the reliability and performance of nanostructures, which are crucial in modern electronics.

Latest Patents

One of his latest patents is titled "Method of reducing pattern collapse in high aspect ratio nanostructures." This invention outlines a treatment process for high aspect ratio nanostructures that enhances their hydrophobic properties. By applying a primer to these nanostructures, David's method effectively prevents damage during rigorous wet cleaning processes involved in semiconductor fabrication. As a result, the increased hydrophobicity significantly reduces the risk of collapse.

Another noteworthy patent from David is "Materials and systems for advanced substrate cleaning." This invention revolves around providing improved cleaning materials, apparatus, and methods for effectively cleaning surfaces of patterned wafers without causing damage to fine features. The unique cleaning materials, which include polymers of various polymeric compounds, can adjust to different viscosities and pH levels, thereby capturing contaminants while ensuring the integrity of the substrate remains intact.

Career Highlights

Throughout his career, David has worked with reputable companies, including Applied Materials, Inc. and Lam Research Corporation. His work in these organizations has equipped him with a deep understanding of semiconductor technologies and fabrication processes, further enhancing his inventive capabilities.

Collaborations

David has collaborated with talented professionals such as Wei Liu and Hiroki Sasano. Their combined expertise and innovative spirit have contributed to breakthroughs in semiconductor technology and the successful realization of new inventions.

Conclusion

David S. L. Mui stands out as a key figure in the semiconductor industry. His inventive contributions, particularly in the area of nanostructure processing and substrate cleaning, demonstrate his commitment to advancing technology. As he continues to innovate, his work will undoubtedly shape the future of semiconductor manufacturing and inspire future inventors.

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