The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Aug. 07, 2002
Michael S. Barnes, San Ramon, CA (US);
John P. Holland, San Jose, CA (US);
David S. L. Mui, Fremont, CA (US);
Wei Liu, San Jose, CA (US);
Michael S. Barnes, San Ramon, CA (US);
John P. Holland, San Jose, CA (US);
David S. L. Mui, Fremont, CA (US);
Wei Liu, San Jose, CA (US);
Other;
Abstract
A substrate is placed in a process zone and an energized process gas is maintained in the process zone to process the substrate. A light beam is reflectively diffracted from a pattern of features of the substrate being processed, the reflected beam is monitored, and a signal is generated in relation to the monitored beam. During processing, a width of the features of the substrate can change. The generated signal is evaluated to detect the occurrence of a change in the width of the features.