The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2012
Filed:
May. 05, 2006
Hyungsuk Alexander Yoon, San Jose, CA (US);
Andrew D. Bailey, Iii, Pleasanton, CA (US);
Jason A. Ryder, Oakland, CA (US);
Mark H. Wilcoxson, Oakland, CA (US);
Jeffrey G. Gasparitsch, Fremont, CA (US);
Randy Johnson, Newark, CA (US);
Stephan P. Hoffmann, Fremont, CA (US);
Hyungsuk Alexander Yoon, San Jose, CA (US);
Andrew D. Bailey, III, Pleasanton, CA (US);
Jason A. Ryder, Oakland, CA (US);
Mark H. Wilcoxson, Oakland, CA (US);
Jeffrey G. Gasparitsch, Fremont, CA (US);
Randy Johnson, Newark, CA (US);
Stephan P. Hoffmann, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An apparatus, system and method for cleaning a substrate edge include a bristle brush unit that cleans bevel polymers deposited on substrate edges using frictional contact in the presence of cleaning chemistry. The bristle brush unit is made up of a plurality of outwardly extending vanes and is mounted on a rotating shaft. An abrasive material is distributed throughout and within the outwardly extending vanes of the bristle brush unit to provide the frictional contact. The bristle brush unit cleans the edge of the substrate by allowing frictional contact of the plurality of abrasive particles with the edge of the substrate in the presence of fluids, such as cleaning chemistry, to cut, rip and tear the bevel polymer from the edge of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile