Jeffrey G Gasparitsch

Title: The Innovative Contributions of Jeffrey G. Gasparitsch

Introduction

Jeffrey G. Gasparitsch, based in Fremont, California, is a notable inventor in the field of substrate edge cleaning technology. With two patents to his name, Gasparitsch has contributed significantly to advancements that enhance manufacturing processes, particularly in semiconductor production.

Latest Patents

Gasparitsch's latest innovations include the following patents:

1. **Apparatus for Isolated Bevel Edge Clean and Method for Using the Same**

This invention presents an apparatus, system, and method for effectively cleaning bevel polymers deposited on substrate edges. It features a bristle brush unit that operates through frictional contact with cleaning chemistry. The design includes multiple outwardly extending vanes mounted on a rotating shaft, incorporating abrasive materials for enhanced cleaning efficiency. This system allows for the removal of bevel polymers by cutting, ripping, and tearing at the substrate's edge.

2. **Apparatus for Cleaning Edge of Substrate and Method for Using the Same**

This patent involves a composite applicator designed to clean bevel polymers on wafer edges utilizing frictional contact in conjunction with fluids. The applicator's structure consists of a supportive material embedded with abrasive particles, allowing for effective engagement with the wafer edges. This method also focuses on using liquid cleaning chemicals to facilitate the removal of unwanted materials from wafer edges.

Career Highlights

Jeffrey G. Gasparitsch has built his career at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His role involves innovating solutions that streamline manufacturing processes and improve the efficiency of wafer processing.

Collaborations

Throughout his career, Gasparitsch has worked closely with noted colleagues such as Jason A. Ryder and Mark Henry Wilcoxson. Their collaborative efforts in the field of semiconductor technology have led to innovative developments and advancements in manufacturing techniques.

Conclusion

Jeffrey G. Gasparitsch's contributions to cleaning technologies in semiconductor manufacturing exemplify the power of innovation. His two patents showcase his commitment to improving production efficiency, and his collaborations further highlight the importance of teamwork in driving technological advancements. As the industry evolves, the impact of his inventions will undoubtedly continue to resonate.